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Proceedings Paper

A reflectometer for at-wavelength characterization of XUV-reflection gratings
Author(s): F. Eggenstein; P. Bischoff; A. Gaupp; F. Senf; A. Sokolov; T. Zeschke; F. Schäfers
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Paper Abstract

Within our technology center for production of highly efficient precision gratings a versatile 4-circle UHV-reflectometer for synchrotron radiation based at-wavelength characterization has been fabricated. The main feature is the possibility to incorporate real live-sized gratings. The samples are adjustable within six degrees of freedom by a novel UHV-tripod system, and the reflectivity can be measured at all incidence angles for both s- and p-polarization geometry. The reflectometer has been setup in a clean room hutch and it is coupled permanently to the optics beamline PM-1 for the UV and XUV range with the polarization adjustable to either linear or elliptical. The setup will be open to users by the end of 2014.

Paper Details

Date Published: 5 September 2014
PDF: 12 pages
Proc. SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V, 920607 (5 September 2014); doi: 10.1117/12.2061828
Show Author Affiliations
F. Eggenstein, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
P. Bischoff, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
A. Gaupp, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
F. Senf, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
A. Sokolov, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
T. Zeschke, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
F. Schäfers, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)


Published in SPIE Proceedings Vol. 9206:
Advances in Metrology for X-Ray and EUV Optics V
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)

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