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Proceedings Paper

Nanoimprint fabrication of wiregrids micro-polarizers in near infrared spectra using SU-8 as an intermediate film
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Paper Abstract

In this paper, we demonstrate a wiregrid polarizer for the near-IR spectrum fabricated by nanoimprint techniques. High resolution grating structures with 215nm in linewidth, 375nm pitch and 235nm total height were patterned on silicon by deep-UV interference lithography followed by reactive ion etching. The grating structures were transferred to a SU-8 thin film by nanoimprint. Then a glancing angle deposition was performed to build the wiregrids. The extinction ratio was measured to be over 90:1 at 1064nm.

Paper Details

Date Published: 28 August 2014
PDF: 6 pages
Proc. SPIE 9170, Nanoengineering: Fabrication, Properties, Optics, and Devices XI, 917010 (28 August 2014); doi: 10.1117/12.2061230
Show Author Affiliations
Junxin Wang, Univ. of Dayton (United States)
Andrew M. Sarangan, Univ. of Dayton (United States)


Published in SPIE Proceedings Vol. 9170:
Nanoengineering: Fabrication, Properties, Optics, and Devices XI
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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