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Proceedings Paper

Aberration analysis and calculation in system of Gaussian beam illuminates lenslet array
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Paper Abstract

Low order aberration was founded when focused Gaussian beam imaging at Kodak KAI -16000 image detector, which is integrated with lenslet array. Effect of focused Gaussian beam and numerical simulation calculation of the aberration were presented in this paper. First, we set up a model of optical imaging system based on previous experiment. Focused Gaussian beam passed through a pinhole and was received by Kodak KAI -16000 image detector whose microlenses of lenslet array were exactly focused on sensor surface. Then, we illustrated the characteristics of focused Gaussian beam and the effect of relative space position relations between waist of Gaussian beam and front spherical surface of microlenses to the aberration. Finally, we analyzed the main element of low order aberration and calculated the spherical aberration caused by lenslet array according to the results of above two steps. Our theoretical calculations shown that , the numerical simulation had a good agreement with the experimental result. Our research results proved that spherical aberration was the main element and made up about 93.44% of the 48 nm error, which was demonstrated in previous experiment. The spherical aberration is inversely proportional to the value of divergence distance between microlens and waist, and directly proportional to the value of the Gaussian beam waist radius.

Paper Details

Date Published: 8 September 2014
PDF: 7 pages
Proc. SPIE 9195, Optical System Alignment, Tolerancing, and Verification VIII, 91950I (8 September 2014); doi: 10.1117/12.2060476
Show Author Affiliations
Zhu Zhao, Beijing Institute of Technology (China)
Mei Hui, Beijing Institute of Technology (China)
Ping Zhou, College of Optical Sciences, The Univ. of Arizona (United States)
Tianquan Su, College of Optical Sciences, The Univ. of Arizona (United States)
Yun Feng, Beijing Institute of Technology (China)
Yuejin Zhao, Beijing Institute of Technology (China)


Published in SPIE Proceedings Vol. 9195:
Optical System Alignment, Tolerancing, and Verification VIII
José Sasián; Richard N. Youngworth, Editor(s)

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