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Proceedings Paper

Realization of a high-aperture ratio in a novel 2.8-inch diagonal VGA thin film diode (TFD)-R projection display
Author(s): Johannes G.R. van Mourik; Robert A. Hartman; R. van der Kloet; F. Leenhouts
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Paper Abstract

Active Matrix Liquid Crystal Displays used for projection applications are commonly manufactured in Thin Film Transistor (TFT) technology using amorphous or poly silicon. Displays available on the market exhibit an aperture ratio of about 30%. The rather low aperture ratio is due to the presence of column and row electrodes, a storage capacitor and a black mask. This black mask also has to hide light leakage due to disclination lines caused by lateral electrical fields. In this paper it will be shown that the TFD-R technology offers several advantages over the TFT technology with respect to the aperture ratio and the elimination of disclination lines resulting from lateral fields. On the basis of the TFD-R technology LCDs have been developed exhibiting a high aperture ratio. The high luminance capability of TFD-R LCD based projectors was demonstrated by comparing a projector provided with 2.8' TFT LCDs and the same projector provided with 2.8' TFD-R LCDs.

Paper Details

Date Published: 7 April 1995
PDF: 8 pages
Proc. SPIE 2407, Projection Displays, (7 April 1995); doi: 10.1117/12.205884
Show Author Affiliations
Johannes G.R. van Mourik, Flat Panel Display Co. BV (Netherlands)
Robert A. Hartman, Flat Panel Display Co. BV (Netherlands)
R. van der Kloet, Flat Panel Display Co. BV (Netherlands)
F. Leenhouts, Flat Panel Display Co. BV (Netherlands)


Published in SPIE Proceedings Vol. 2407:
Projection Displays
Ming Hsien Wu, Editor(s)

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