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Proceedings Paper

CVD diamond film oxidation resistance research
Author(s): Longwei Jing; Xiaoping Wang; Lijun Wang; Xiufang Pan; Yiqing Sun; Jinye Wang; Hongtao Sun
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Paper Abstract

Diamond films were deposited on a silicon substrate by microwave plasma chemical vapor deposition system, and its oxidation experiments were carried out in atmospheric environmental condition by using a muffle furnace. Inatmospheric environment (the temperature is from 400°C to 900°C) the oxidation resistance of diamond thin films was investigated. The results indicate that under the atmospheric environment diamond thin film surface morphology did not change after 6 hours at 400°C. Diamond thin film surface morphology began to change after 2 hours at 600°C, and when time was extended to 4 hours, the diamond thin film surface morphology changed significantly. The surface morphology of diamond films began to change after 15 minutes at a 700°C condition and when time was extended to 6 hours diamond films were all destroyed. All the diamond films on the silicon substrate disappeared completely in 20 minutes at 900°C. The intact crystal face is the reason that natural diamond has stable chemical property. The crystal face of synthetic diamond film has a lot of defects, especially on the side. Oxidation of the diamond films begin with the grain boundary and defects.

Paper Details

Date Published: 16 December 2013
PDF: 6 pages
Proc. SPIE 9068, Eighth International Conference on Thin Film Physics and Applications, 90681B (16 December 2013); doi: 10.1117/12.2053922
Show Author Affiliations
Longwei Jing, Univ. of Shanghai for Science and Technology (China)
Xiaoping Wang, Univ. of Shanghai for Science and Technology (China)
Lijun Wang, Univ. of Shanghai for Science and Technology (China)
Xiufang Pan, Univ. of Shanghai for Science and Technology (China)
Yiqing Sun, Univ. of Shanghai for Science and Technology (China)
Jinye Wang, Univ. of Shanghai for Science and Technology (China)
Hongtao Sun, Univ. of Shanghai for Science and Technology (China)


Published in SPIE Proceedings Vol. 9068:
Eighth International Conference on Thin Film Physics and Applications
Junhao Chu; Chunrui Wang, Editor(s)

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