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Proceedings Paper

Vanadium oxide thin film with improved sheet resistance uniformity
Author(s): Francis Généreux; Francis Provençal; Bruno Tremblay; Marc-André Boucher; Christian Julien; Christine Alain
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Paper Abstract

This paper reports on the deposition of vanadium oxide thin films with sheet resistance uniformity better than 2.5% over a 150 mm wafer. The resistance uniformity within the array is estimated to be less than 1%, which is comparable with the value reported for amorphous silicon-based microbolometer arrays. In addition, this paper also shows that the resistivity of vanadium oxide, like amorphous silicon, can be modeled by Arrhenius' equation. This result is expected to significantly ease the computation of the correction table required for TEC-less operation of VOx-based microbolometer arrays.

Paper Details

Date Published: 24 June 2014
PDF: 9 pages
Proc. SPIE 9070, Infrared Technology and Applications XL, 90701R (24 June 2014); doi: 10.1117/12.2053465
Show Author Affiliations
Francis Généreux, INO (Canada)
Francis Provençal, INO (Canada)
Bruno Tremblay, INO (Canada)
Marc-André Boucher, INO (Canada)
Christian Julien, INO (Canada)
Christine Alain, INO (Canada)


Published in SPIE Proceedings Vol. 9070:
Infrared Technology and Applications XL
Bjørn F. Andresen; Gabor F. Fulop; Charles M. Hanson; Paul R. Norton, Editor(s)

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