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Proceedings Paper

Nanostructured system SiO2/Si by ArF excimer laser irradiation
Author(s): C. T. Huynh; A. M. Skvortsov; A. A. Petrov
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Paper Abstract

In this work, the formation of micro-and nanoscale periodic structures on the surface of system SiO2/Si by nanosecond laser pulses has been investigated. Under irradiation of experimental samples with ultraviolet ArF laser pulse (193 nm) were obtained periodic wave-like structures on the surface. The dependence of the surface topology of system SiO2/Si on the energy density of the laser pulse and the number of pulses has been studied.

Paper Details

Date Published: 28 November 2013
PDF: 4 pages
Proc. SPIE 9065, Fundamentals of Laser-Assisted Micro- and Nanotechnologies 2013, 90650T (28 November 2013); doi: 10.1117/12.2053278
Show Author Affiliations
C. T. Huynh, National Research Univ. of Information Technologies, Mechanics and Optics (Russian Federation)
A. M. Skvortsov, National Research Univ. of Information Technologies, Mechanics and Optics (Russian Federation)
A. A. Petrov, National Research Univ. of Information Technologies, Mechanics and Optics (Russian Federation)


Published in SPIE Proceedings Vol. 9065:
Fundamentals of Laser-Assisted Micro- and Nanotechnologies 2013
Vadim P. Veiko; Tigran A. Vartanyan, Editor(s)

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