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Proceedings Paper

Model for atomic layer deposition on inner wall of rectangular pipes with large aspect ratio
Author(s): Yuqing Xiong; Maojin Dong; Kun Li; Jizhou Wang; Ni Ren
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Paper Abstract

Feasibility of thin films deposited on inner wall of rectangular pipes with length aspect ratio up to 50 by atomic layer deposition was studied, by solving kinetics equation of gas adsorption on inner wall of pipes. And the time for reactants to reach saturated adsorption in pipes was calculated. Furthermore, the process of thin film deposition by atomic layer deposition was simulated by Kinetic Monte Carlo method, and a growth model for atomic layer deposition of aluminum on inner wall of long rectangular pipes was established.

Paper Details

Date Published: 16 December 2013
PDF: 6 pages
Proc. SPIE 9068, Eighth International Conference on Thin Film Physics and Applications, 90680C (16 December 2013); doi: 10.1117/12.2053143
Show Author Affiliations
Yuqing Xiong, Lanzhou Institute of Physics (China)
Maojin Dong, Lanzhou Institute of Physics (China)
Kun Li, Lanzhou Institute of Physics (China)
Jizhou Wang, Lanzhou Institute of Physics (China)
Ni Ren, Lanzhou Institute of Physics (China)


Published in SPIE Proceedings Vol. 9068:
Eighth International Conference on Thin Film Physics and Applications
Junhao Chu; Chunrui Wang, Editor(s)

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