Share Email Print

Proceedings Paper

Scanner correction capabilities aware CMP lithography hotspot analysis
Author(s): Ushasree Katakamsetty; Hui Colin; Sky Yeo; Perez Valerio; Yang Qing; Quek Shyue Fong; Narayana Samy Aravind; Ruhm Matthias; Schiwon Roberto
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

CMP effects on manufacturability are becoming more prominent as we move towards advanced process nodes, 28nm and below. It is well known that dishing and erosion occur during CMP process, and they strongly depend on pattern density, line spacing and line width [1]. Excessive thickness or topography variations can lead to shrinkage of process windows, causing potential yield problems such as resist lifting or printability issues. When critical patterns fall into regions with extreme topography variations, they would be more sensitive to defects and could potentially become yield limiters or killers. Scanner tools compensate and correct topography variations by following the given profile [2]. However the scanner exposure window size is wider compared to local topography variations in design. This difference would generate new lithography focus sensitive weak points which may be missed. Experiments have been conducted as shown in Fig 1. Design under manufacturing has been subjected to scanner tool topography focus corrections. Despite of the corrections, Site B topography height has worsened while site A and C shown some improvements. As a result, additional improvements need to be done to meet manufacturability requirements.

Paper Details

Date Published: 28 March 2014
PDF: 7 pages
Proc. SPIE 9053, Design-Process-Technology Co-optimization for Manufacturability VIII, 905312 (28 March 2014); doi: 10.1117/12.2053035
Show Author Affiliations
Ushasree Katakamsetty, GLOBALFOUNDRIES Singapore (Singapore)
Hui Colin, GLOBALFOUNDRIES Singapore (Singapore)
Sky Yeo, GLOBALFOUNDRIES Singapore (Singapore)
Perez Valerio, GLOBALFOUNDRIES Singapore (Singapore)
Yang Qing, GLOBALFOUNDRIES Singapore (Singapore)
Quek Shyue Fong, GLOBALFOUNDRIES Singapore (Singapore)
Narayana Samy Aravind, GLOBALFOUNDRIES Germany (Germany)
Ruhm Matthias, GLOBALFOUNDRIES Germany (Germany)
Schiwon Roberto, GLOBALFOUNDRIES Germany (Germany)

Published in SPIE Proceedings Vol. 9053:
Design-Process-Technology Co-optimization for Manufacturability VIII
John L. Sturtevant; Luigi Capodieci, Editor(s)

© SPIE. Terms of Use
Back to Top