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Proceedings Paper

Reactive low-voltage ion plating of hard silicon nitride optical thin films and their characterization
Author(s): Juergen Ramm; Ralf Hora; Bertrand G. Bovard
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Paper Abstract

Silicon nitride films were synthesized in a Balzers BAP 800 coating plant by an plasma enhanced evaporation process. Transparent, stoichiometric films free of hydrogen, oxygen, argon, and heavy metals were obtained. The optical properties, the chemical composition, the microhardness, the structure, and the morphology of the films were investigated.

Paper Details

Date Published: 1 August 1990
PDF: 9 pages
Proc. SPIE 1275, Hard Materials in Optics, (1 August 1990); doi: 10.1117/12.20521
Show Author Affiliations
Juergen Ramm, Balzers AG (Liechtenstein)
Ralf Hora, Balzers AG (Liechtenstein)
Bertrand G. Bovard, Optical Sciences Ctr./Univ. of (United States)


Published in SPIE Proceedings Vol. 1275:
Hard Materials in Optics
Carl-Gustaf Ribbing, Editor(s)

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