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Proceedings Paper

Plasma- and ion-assisted PVD technologies for the production of hard optical coatings
Author(s): Hans K. Pulker
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Paper Abstract

High quality dielectric films are required today for various interference optical applications and for planar wave guides in integrated optics. Many inorganic chemical compounds which were difficult to deposit by conventional techniques in form of well adherent, dense, hard and stable low-loss films are now routinly synthesized by reactive gas discharge plasma and energetic ion and/or coating materials atom processes. A survey over such PVD coating technologies and on the resulting film properties is given in this paper.

Paper Details

Date Published: 1 August 1990
PDF: 12 pages
Proc. SPIE 1275, Hard Materials in Optics, (1 August 1990); doi: 10.1117/12.20520
Show Author Affiliations
Hans K. Pulker, Balzers AG (Liechtenstein)


Published in SPIE Proceedings Vol. 1275:
Hard Materials in Optics
Carl-Gustaf Ribbing, Editor(s)

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