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Proceedings Paper

Reactive sputtering of hard optical films of tin oxide
Author(s): Ronald P. Howson; Hana Barankova; Alaric G. Spencer
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Paper Abstract

Tin was sputtered from a DC planar magiistrcn target in a confined volume , stabilitywas maintained in the reactive sputtering by controlling the oxygen partial prire throogh observation of this liajit emitted by the oxygen in the -ofthe magnetron. The material deposited on this walls of the chamber was designed to getter this system of imt, The oxygen coisumption at the set point was a good indication oftlis approach to stoichiometiy of tbo film. It was observed that trazspazent oonckxting filnis were prepared at the point where this oxygen comaimption indicated a break from fill izxorporalion into the growing film. Films there had a resistivity of 100 micro ohm-meters for a 600 ohms per sqisze sheet restance, a thickne ofabont 150 naix>.meters. Tlisse filnis showed some o1 absorption in the bhis regkm oftho spectziim. Optically clear filnis required preparation in a greater oxygen rteeane which reckd the rate ofdeposition by a factor c(two. The refractive index was measuied as2.Oat633nm.

Paper Details

Date Published: 1 August 1990
PDF: 5 pages
Proc. SPIE 1275, Hard Materials in Optics, (1 August 1990); doi: 10.1117/12.20519
Show Author Affiliations
Ronald P. Howson, Loughborough Univ. of Technology (United Kingdom)
Hana Barankova, Institute of Chemical Technolo (Czech Republic)
Alaric G. Spencer, Loughborough Consultants Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 1275:
Hard Materials in Optics
Carl-Gustaf Ribbing, Editor(s)

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