Share Email Print

Proceedings Paper

Wavefront sensor sampling plane fabricated by maskless grayscale lithography
Author(s): G. A. Cirino; F. T. Amaral; S. A. Lopera; A. N. Montagnolil; A. Arruda; R. D. Mansano; T. M.-Brahim; D. W. L. Monteiro
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

In this work we report the design and characterization of a Shack-Hartmann wavefront sampling plane based on a microlens array (MLA) composed of 12 X 12 hexagonal contiguous diffractive lenslet, with 355 μm pitch, 4.5 mm focal length, and 4.3 X 4.3 mm lateral dimensions. The device was fabricated by maskless grayscale lithography based on Digital Light Projector (DLP) technology. Optical characterization was performed in order to measure wavefront aberrations in Zernike polynomials terms. Intraocular lenses were used as test elements because they yield well-known optical aberrations, such as defocus and spherical aberration. For the wavefront reconstruction, the modal approach was used, in which the first derivatives of Zernike polynomials are used as the set of orthogonal basis functions. The corresponding polynomial coefficients up to the first 10 Zernike terms were obtained and the resulting reconstructed wavefront presents an RMS reconstruction error compliant to most optical systems of interest.

Paper Details

Date Published: 2 May 2014
PDF: 6 pages
Proc. SPIE 9130, Micro-Optics 2014, 91300C (2 May 2014); doi: 10.1117/12.2051698
Show Author Affiliations
G. A. Cirino, Univ. Federal de São Carlos (Brazil)
F. T. Amaral, Univ. Federal de Minas Gerais (Brazil)
S. A. Lopera, Univ. de São Paulo (Brazil)
A. N. Montagnolil, Univ. Federal de São Carlos (Brazil)
A. Arruda, Independent Consultant (Brazil)
R. D. Mansano, Univ. de São Paulo (Brazil)
T. M.-Brahim, Univ. de Rennes 1 (France)
D. W. L. Monteiro, Univ. Federal de Minas Gerais (Brazil)

Published in SPIE Proceedings Vol. 9130:
Micro-Optics 2014
Hugo Thienpont; Jürgen Mohr; Hans Zappe; Hirochika Nakajima, Editor(s)

© SPIE. Terms of Use
Back to Top