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Proceedings Paper

Boron-doped diamond films on silicon studied by Raman and infrared spectroscopies
Author(s): Ken Okano; Tateki Kurosu; Masamori Iida; Thomas Eickhoff; Hans Wilhelm; Dietrich R. T. Zahn
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Paper Abstract

Boron doped diamond films were deposited onto (100) orientated Si substrates using a thermal filament CVD method. Boron trioxide was used as a doping source and samples with boron to carbon (B/C) ratios of 0, 10, 100, and 1000 ppm were prepared for the optical measurements. The infrared (IR) results reveal the formation of an ultrathin SiC layer at the interface between Si and diamond. Furthermore, the IR data confirm the resistivity data obtained from electrical measurements. Raman spectroscopy was used to probe the quality and homogeneity of the diamond films. Upon increasing B/C ratio the diamond phonon line shifts to lower frequency and is also broadened revealing a softening of the diamond. In addition, the optical absorption was found to increase strongly with increasing B/c ratio.

Paper Details

Date Published: 1 August 1990
PDF: 11 pages
Proc. SPIE 1275, Hard Materials in Optics, (1 August 1990); doi: 10.1117/12.20513
Show Author Affiliations
Ken Okano, Tokai Univ. (Japan)
Tateki Kurosu, Tokai Univ. (Japan)
Masamori Iida, Tokai Univ. (Japan)
Thomas Eickhoff, RWTH Aachen (Germany)
Hans Wilhelm, Technische Univ. Berlin (Germany)
Dietrich R. T. Zahn, Technische Univ. Berlin (Germany)

Published in SPIE Proceedings Vol. 1275:
Hard Materials in Optics
Carl-Gustaf Ribbing, Editor(s)

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