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Proceedings Paper

Progress on EUV pellicle development
Author(s): Carmen Zoldesi; Kursat Bal; Brian Blum; Guus Bock; Derk Brouns; Florian Dhalluin; Nina Dziomkina; Juan Diego Arias Espinoza; Joost de Hoogh; Silvester Houweling; Maarten Jansen; Mohammad Kamali; Alain Kempa; Ronald Kox; Robert de Kruif; Jorge Lima; Yang Liu; Henk Meijer; Hans Meiling; Ijen van Mil; Marco Reijnen; Luigi Scaccabarozzi; Daniel Smith; Beatrijs Verbrugge; Laurens de Winters; Xugang Xiong; John Zimmerman
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Paper Abstract

As EUV approaches high volume manufacturing, reticle defectivity becomes an even more relevant topic for further investigation. Current baseline strategy for EUV defectivity management is to design, build and maintain a clean system without pellicle. In order to secure reticle front side particle adders to an acceptable level for high volume manufacturing, EUV pellicle is being actively investigated. Last year ASML reported on our initial EUV pellicle feasibility. In this paper, we will update on our progress since then. We will also provide an update to pellicle requirements published last year. Further, we present experimental results showing the viability and challenges of potential EUV pellicle materials, including, material properties, imaging capability, scalability and manufacturability.

Paper Details

Date Published: 17 April 2014
PDF: 10 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90481N (17 April 2014); doi: 10.1117/12.2049276
Show Author Affiliations
Carmen Zoldesi, ASML Netherlands B.V. (Netherlands)
Kursat Bal, ASML Netherlands B.V. (Netherlands)
Brian Blum, ASML (United States)
Guus Bock, ASML Netherlands B.V. (Netherlands)
Derk Brouns, ASML Netherlands B.V. (Netherlands)
Florian Dhalluin, ASML Netherlands B.V. (Netherlands)
Nina Dziomkina, ASML Netherlands B.V. (Netherlands)
Juan Diego Arias Espinoza, ASML Netherlands B.V. (Netherlands)
Joost de Hoogh, ASML Netherlands B.V. (Netherlands)
Silvester Houweling, ASML Netherlands B.V. (Netherlands)
Maarten Jansen, ASML Netherlands B.V. (Netherlands)
Mohammad Kamali, ASML Netherlands B.V. (Netherlands)
Alain Kempa, ASML Netherlands B.V. (Netherlands)
Ronald Kox, ASML Netherlands B.V. (Netherlands)
Robert de Kruif, ASML Netherlands B.V. (Netherlands)
Jorge Lima, ASML Netherlands B.V. (Netherlands)
Yang Liu, ASML Netherlands B.V. (Netherlands)
Henk Meijer, ASML Netherlands B.V. (Netherlands)
Hans Meiling, ASML Netherlands B.V. (Netherlands)
Ijen van Mil, ASML Netherlands B.V. (Netherlands)
Marco Reijnen, ASML Netherlands B.V. (Netherlands)
Luigi Scaccabarozzi, ASML Netherlands B.V. (Netherlands)
Daniel Smith, ASML Netherlands B.V. (Netherlands)
Beatrijs Verbrugge, ASML Netherlands B.V. (Netherlands)
Laurens de Winters, ASML Netherlands B.V. (Netherlands)
Xugang Xiong, ASML (United States)
John Zimmerman, ASML (United States)


Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood; Eric M. Panning, Editor(s)

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