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Proceedings Paper

System for high-sensitivity measurement of birefringence using a photoelastic modulator, and its applications
Author(s): Niall O'Flaherty; Naoshi Kiyomoto; Ichiro Shirahama; Yoshihiro Mochida
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Paper Abstract

The construction and applications of a system for measuring optical birefringence are described. As the system utilizes a photo-elastic modulator for the modulation of incident linearly polarized light, measured data includes not only high resolu- tion of birefringence retardation but also a direction of fast axis of retardation which corresponds to the direction of molecular orientation. The resolution of measured birefringence of this system is i08. As this system is designed for the study of the three-dimensional anisotropic properties and molecular orientation of glass, polymer films and ultra thin organic films such as Langmuir-Brodgett films, some of its applications are discussed.

Paper Details

Date Published: 1 August 1990
PDF: 10 pages
Proc. SPIE 1274, Electro-Optic and Magneto-Optic Materials II, (1 August 1990); doi: 10.1117/12.20490
Show Author Affiliations
Niall O'Flaherty, ORC Manufacturing Co., Ltd. (Japan)
Naoshi Kiyomoto, ORC Manufacturing Co., Ltd. (Japan)
Ichiro Shirahama, ORC Manufacturing Co., Ltd. (Japan)
Yoshihiro Mochida, ORC Manufacturing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 1274:
Electro-Optic and Magneto-Optic Materials II
Hans Dammann, Editor(s)

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