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Proceedings Paper

Process diagnostics and control for excimer laser processing
Author(s): Karsten Schutte; Emil Schubert; Hans Wilhelm Bergmann
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Paper Abstract

The present contribution focuses on fundamental investigations and possible methods for quality and process control mechanisms, especially for the removal of thin hard films and deformation layers from metallic substrates. Extended fundamental investigations including short time photography and plasma emission spectroscopy were carried out to characterize the plasma formation and propagation during excimer laser treatment. The influence of both the laser and process parameters (wavelength, energy density, number of pulses, ambient gas type and pressure) on the process and the plasma properties is determined. The investigated plasma emission spectra is strongly correlated to the surface modifications achieved. It will be outlined how these signals can be used for process control in excimer laser assisted processing.

Paper Details

Date Published: 31 March 1995
PDF: 8 pages
Proc. SPIE 2502, Gas Flow and Chemical Lasers: Tenth International Symposium, (31 March 1995); doi: 10.1117/12.204886
Show Author Affiliations
Karsten Schutte, Univ. Erlangen-Nuernberg (Germany)
Emil Schubert, Univ. Erlangen-Nuernberg (Germany)
Hans Wilhelm Bergmann, Univ. Erlangen-Nuernberg (Germany)

Published in SPIE Proceedings Vol. 2502:
Gas Flow and Chemical Lasers: Tenth International Symposium
Willy L. Bohn; Helmut Huegel, Editor(s)

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