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Proceedings Paper

The measurement uncertainty of CD measurement in the optical measurement technology using Fourier image
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Paper Abstract

Optical metrology system is used as high sampling CD measurement. The optical measurement technology using Fourier image can obtain much information with various optical conditions. We evaluated Fourier image method for CD metrology. Various issues of the optical measurement technology were found for CD measurement uncertainty. Measurement uncertainty depends on the number of position on Fourier image, and measurement uncertainty is improved by using multiple positions data. Top CD value is influenced by under layer pattern CD variance and under layer thickness variance. Optical CD measurement technology is influenced by various process variation like under-layer structure, stacked film thickness, material changes and so on. If optical measurement system applies to CD metrology, Fourier image method should be used in development phase for unfixed process because high number of data and speedy process feedback in no under layer situation is needed.

Paper Details

Date Published: 2 April 2014
PDF: 6 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 905034 (2 April 2014); doi: 10.1117/12.2048759
Show Author Affiliations
Kuniharu Nagashima, Toshiba Corp. (Japan)
Hideaki Abe, Toshiba Corp. (Japan)
Makoto Oote, Toshiba Corp. (Japan)
Yuichiro Yamazaki, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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