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Proceedings Paper

Implementation of background scattering variance reduction on the rapid nano particle scanner
Author(s): Peter van der Walle; Sandro Hannemann; Daan van Eijk; Wouter Mulckhuyse; Jacques C. J. van der Donck
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Paper Abstract

The background in simple dark field particle inspection shows a high scatter variance which cannot be distinguished from signals by small particles. According to our models, illumination from different azimuths can reduce the background variance. A multi-azimuth illumination has been successfully integrated on the Rapid Nano particle scanner. This illumination method reduces the variance of the background scattering on substrate roughness. It allows for a lower setting of the detection threshold, resulting in a more sensitive inspection system. By implementing this system the lower detection limit of the scanner was reduced from 59 nm to 42 nm LSE. A next improvement, a change of the inspection wavelength to 193 nm will bring the detection limit to sub 20 nm.

Paper Details

Date Published: 2 April 2014
PDF: 6 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 905033 (2 April 2014); doi: 10.1117/12.2048684
Show Author Affiliations
Peter van der Walle, TNO (Netherlands)
Sandro Hannemann, TNO (Netherlands)
Daan van Eijk, TNO (Netherlands)
Wouter Mulckhuyse, TNO (Netherlands)
Jacques C. J. van der Donck, TNO (Netherlands)

Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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