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Proceedings Paper

ArF photoresist polymers with nitrogen or sulfone moieties for negative tone development process
Author(s): Dong-Gyun Kim; Su-Jee Kwon; Suk-Koo Hong; Joon Je Lee; Hyung Rae Lee; Hyo-jin Yun; Ji-Hoon Baik; Dohyuk Im; Eujean Jang; Jae-Woo Lee; Jae-Hyun Kim; Jong-Chan Lee
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Paper Abstract

A series of nitrogen- and sulfone-containing polymers with different molecular weights and monomer compositions were prepared via free radical polymerization to investigate the effect of polymer structure on the ArF lithographic performance in negative tone development (NTD) process. Conventional ArF photoresist polymers (Ref) were also prepared for comparison purposes. It was found that there are optimum molecular weights of the photoresist polymers to give good lithographic performance in NTD process. Photoresists with amine-containing polymers showed contact hole (CH) patterns with some defects, which could be due to the large amount of acid-quenchable amine moieties in the polymers. Lithographic performance of photoresists with sulfonate-containing polymers was close to that with Ref polymers and much better than that with sulfonamide-containing polymers.

Paper Details

Date Published: 27 March 2014
PDF: 9 pages
Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 905126 (27 March 2014); doi: 10.1117/12.2048674
Show Author Affiliations
Dong-Gyun Kim, Seoul National Univ. (Korea, Republic of)
Su-Jee Kwon, Seoul National Univ. (Korea, Republic of)
Suk-Koo Hong, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Joon Je Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hyung Rae Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hyo-jin Yun, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Ji-Hoon Baik, Seoul National Univ. (Korea, Republic of)
Dohyuk Im, Dongjin Semichem Co., Ltd. (Korea, Republic of)
Eujean Jang, Dongjin Semichem Co., Ltd. (Korea, Republic of)
Jae-Woo Lee, Dongjin Semichem Co., Ltd. (Korea, Republic of)
Jae-Hyun Kim, Dongjin Semichem Co., Ltd. (Korea, Republic of)
Jong-Chan Lee, Seoul National Univ. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9051:
Advances in Patterning Materials and Processes XXXI
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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