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Proceedings Paper

Nanoimprint lithography process chains for the fabrication of micro- and nanodevices
Author(s): Helmut Schift
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Paper Abstract

The nanoimprint lithography (NIL) process with its key elements molding and thin film pattern transfer refers to the established process chain of resist-based patterning of hard substrates. Typical processes for mass-fabrication are either fast wafer-like substrate imprint or to continuous foils by roll-to-roll processes. In contrast to this, similar process chains were established for polymeric micro-elements fabricated by injection molding, particularly when surface topographies need to be integrated into monolithic polymer elements. NIL needs to be embedded into the framework of general replication technologies, with sizes ranging from nanoscopic details to macroscopic entities. This contribution presents elements of a generalized replication process chain involving NIL and demonstrates its wide application by presenting a non-typical NIL product such as an injection molded micro-cantilever. Additionally a hybrid approach combining the NIL and injection molding in a single tool is presented. Its aim is to introduce the toolbox approach for nanoreplication into NIL-based processing and to facilitate the choice of suitable processes for micro- and nanodevices. By proposing a standardized process flow as described in the NaPANIL Library of Processes, the use of establish process sequences for new applications will be facilitated.

Paper Details

Date Published: 28 March 2014
PDF: 10 pages
Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90491E (28 March 2014); doi: 10.1117/12.2048517
Show Author Affiliations
Helmut Schift, Paul Scherrer Institut (Switzerland)


Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)

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