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Proceedings Paper

AIS wavefront sensor: a robust optical test of exposure tools using localized wavefront curvature
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Paper Abstract

We present an update of the AIS wavefront sensor, a diagnostic sensor set for insertion in the upgraded 0.5 NA SEMATECH Albany and Berkeley METs. AIS works by using offset monopole illumination to probe localized regions of the test optic pupil. Variations in curvature manifest as focus shifts, which are measured using a photodiode- based grating-on- grating contrast monitor, and the wavefront aberrations are reconstructed using a least-squares approach. We present results from an optical prototype of AIS demonstrating an accuracy of better than λ/30 rms for Zernike polynomials Z4 through Z10. We also discuss integration strategies and requirements as well as specifications on system alignment.

Paper Details

Date Published: 17 April 2014
PDF: 7 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90483A (17 April 2014); doi: 10.1117/12.2048389
Show Author Affiliations
Ryan Miyakawa, Lawrence Berkeley National Lab. (United States)
Xibin Zhou, SEMATECH Inc. (United States)
Michael Goldstein, SEMATECH Inc. (United States)
Intel Corp. (United States)
Dominic Ashworth, SEMATECH Inc. (United States)
Kevin Cummings, SEMATECH Inc. (United States)
Yu-Jen Fan, SEMATECH Inc. (United States)
Yashesh Shroff, Intel Corp. (United States)
Greg Denbeaux, SUNY College of Nanoscale Science and Engineering (United States)
Yudhi Kandel, SUNY College of Nanoscale Science and Engineering (United States)
Patrick Naulleau, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood; Eric M. Panning, Editor(s)

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