Share Email Print
cover

Proceedings Paper

Actinic mask imaging: recent results and future directions from the SHARP EUV microscope
Author(s): Kenneth A. Goldberg; Markus P. Benk; Antoine Wojdyla; Iacopo Mochi; Senajith B. Rekawa; Arnaud P. Allezy; Michael R. Dickinson; Carl W. Cork; Weilun Chao; Daniel J. Zehm; James B. Macdougall; Patrick P. Naulleau; Anne Rudack
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The SEMATECH High Numerical Aperture Actinic Reticle Review Project (SHARP) is a synchrotron-based extreme ultraviolet (EUV) microscope dedicated to photomask research. SHARP has been operational and serving users since June, 2013, and in eight months, SHARP has recorded over 71,000 high-resolution images. Exposure times are 5 to 8 seconds, and 8 or more through-focus series can be collected per hour at positions spanning the entire mask surface. SHARP’s lossless coherence-control illuminator and variable numerical aperture (NA) enable researchers to emulate the imaging properties of both current and future EUV lithography tools. SHARP’s performance continues to improve over time due to tool learning and upgraded capabilities, described here. Within a centered, 3-μm square image region, we demonstrate an illumination power stability above 99%, and an average uniformity of 98.4%. Demonstrations of through-focus imaging with various illumination coherence settings highlight the capabilities of SHARP.

Paper Details

Date Published: 17 April 2014
PDF: 10 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90480Y (17 April 2014); doi: 10.1117/12.2048364
Show Author Affiliations
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
Markus P. Benk, Lawrence Berkeley National Lab. (United States)
Antoine Wojdyla, Lawrence Berkeley National Lab. (United States)
Iacopo Mochi, Lawrence Berkeley National Lab. (United States)
Senajith B. Rekawa, Lawrence Berkeley National Lab. (United States)
Arnaud P. Allezy, Lawrence Berkeley National Lab. (United States)
Michael R. Dickinson, Lawrence Berkeley National Lab. (United States)
Carl W. Cork, Lawrence Berkeley National Lab. (United States)
Weilun Chao, Lawrence Berkeley National Lab. (United States)
Daniel J. Zehm, Lawrence Berkeley National Lab. (United States)
James B. Macdougall, Lawrence Berkeley National Lab. (United States)
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
Anne Rudack, SEMATECH Inc. (United States)


Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood; Eric M. Panning, Editor(s)

© SPIE. Terms of Use
Back to Top