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Proceedings Paper

Improvements in bandwidth and wavelength control for XLR 660xi systems
Author(s): Will Conley; Hoang Dao; David Dunlap; Ronnie P. Flores; Matt Lake; Kevin O'Brien; Alicia Russin; Aleks Simic; Josh Thornes; Brian Wehrung; John Wyman
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Paper Abstract

As chipmakers continue to reduce feature sizes and shrink CDs on the wafer to meet customer needs, Cymer continues developing light sources that enable advanced lithography, and introducing innovations to improve productivity, wafer yield, and cost of ownership. In particular, the architecture provides dose control and improved spectral bandwidth stability, both of which enables superior CD control and wafer yield for the chipmaker. The XLR 660ix incorporates new controller technology called ETC for improvements in spectral bandwidth stability, energy dose stability, and wavelength stability. This translates to improved CD control and higher wafer yields. The authors will discuss the impact that these improvements will have in advanced lithography applications.

Paper Details

Date Published: 31 March 2014
PDF: 5 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 90521H (31 March 2014); doi: 10.1117/12.2048305
Show Author Affiliations
Will Conley, Cymer, an ASML company (United States)
Hoang Dao, Cymer, an ASML company (United States)
David Dunlap, Cymer, an ASML company (United States)
Ronnie P. Flores, Canon Inc. (United States)
Matt Lake, Cymer, an ASML company (United States)
Kevin O'Brien, Cymer, an ASML company (United States)
Alicia Russin, Cymer, an ASML company (United States)
Aleks Simic, Cymer, an ASML company (United States)
Josh Thornes, Cymer, an ASML company (United States)
Brian Wehrung, Cymer, an ASML company (United States)
John Wyman, Cymer, an ASML company (United States)


Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)

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