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Proceedings Paper

Bringing SEM-contour based OPC to production
Author(s): François Weisbuch; Kar Kit Koh; Kenneth Jantzen
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Paper Abstract

Calibrating an accurate OPC model usually requires a lot of one-dimensional CD-SEM measurements. A promising alternative is to use a SEM image contour approach but many challenges remain to implement this technique for production. In this work a specific flow is presented to get good and reliable contours well matched with traditional CDSEM measurements. Furthermore this work investigates the importance of site selection (number, type, image space coverage) for a successful contour-based OPC model. Finally the comparison of conventional and contour based models takes into account the calibration and verification performances of both models with a possible cross verification between model data sets. Specific advantages of contour based model are also discussed.

Paper Details

Date Published: 31 March 2014
PDF: 13 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 905224 (31 March 2014); doi: 10.1117/12.2048288
Show Author Affiliations
François Weisbuch, GLOBALFOUNDRIES Dresden (Germany)
Kar Kit Koh, GLOBALFOUNDRIES Singapore (Singapore)
Kenneth Jantzen, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)

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