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Proceedings Paper

LPP EUV source readiness for NXE 3300B
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Paper Abstract

Laser produced plasma (LPP) light sources have been developed as the primary approach for EUV scanner imaging of circuit features in sub-20nm devices in high volume manufacturing (HVM). This paper provides a review of development progress and readiness status for the LPP extreme-ultra-violet (EUV) source. We present the latest performance results from second generation sources, including Prepulse operation for high power, collector protection for long lifetime and low cost of ownership, and dose stability for high yield. Increased EUV power is provided by a more powerful drive laser and the use of Prepulse operation for higher conversion efficiciency. Advanced automation and controls have been developed to provide the power and energy stability performance required during production fab operation. We will also discuss lifetesting of the collector in Prepulse mode and show the ability of the debris mitigation systems to keep the collector multi-layer coating free from damage and maintain high reflectivity.

Paper Details

Date Published: 18 March 2014
PDF: 8 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90480C (18 March 2014); doi: 10.1117/12.2048184
Show Author Affiliations
David C. Brandt, Cymer LLC (United States)
Igor V. Fomenkov, Cymer LLC (United States)
Nigel R. Farrar, Cymer LLC (United States)
Bruno La Fontaine, Cymer LLC (United States)
David W. Myers, Cymer LLC (United States)
Daniel J. Brown, Cymer LLC (United States)
Alex I. Ershov, Cymer LLC (United States)
Norbert R. Böwering, Cymer LLC (United States)
Daniel J. Riggs, Cymer LLC (United States)
Robert J. Rafac, Cymer LLC (United States)
Silvia De Dea, Cymer LLC (United States)
Rudy Peeters, ASML Netherlands B.V. (Netherlands)
Hans Meiling, ASML Netherlands B.V. (Netherlands)
Noreen Harned, ASML Netherlands B.V. (Netherlands)
Daniel Smith, ASML Netherlands B.V. (Netherlands)
Alberto Pirati, ASML Netherlands B.V. (Netherlands)
Robert Kazinczi, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood; Eric M. Panning, Editor(s)

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