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Proceedings Paper

Influence of litho patterning on DSA placement errors
Author(s): Sander Wuister; Tamara Druzhinina; Davide Ambesi; Bart Laenens; Linda He Yi; Jo Finders
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Paper Abstract

Directed self-assembly of block copolymers is currently being investigated as a shrinking technique complementary to lithography. One of the critical issues about this technique is that DSA induces the placement error. In this paper, study of the relation between confinement by lithography and the placement error induced by DSA is demonstrated. Here, both 193i and EUV pre-patterns are created using a simple algorithm to confine two contact holes formed by DSA on a pitch of 45nm. Full physical numerical simulations were used to compare the impact of the confinement on DSA related placement error, pitch variations due to pattern variations and phase separation defects.

Paper Details

Date Published: 28 March 2014
PDF: 13 pages
Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90491O (28 March 2014); doi: 10.1117/12.2048065
Show Author Affiliations
Sander Wuister, ASML Netherlands B.V. (Netherlands)
Tamara Druzhinina, ASML Netherlands B.V. (Netherlands)
Davide Ambesi, ASML Netherlands B.V. (Netherlands)
Bart Laenens, Brion Technologies, Inc. (United States)
Linda He Yi, Stanford Univ. (United States)
Jo Finders, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)

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