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Proceedings Paper

In-line focus monitoring and fast determination of best focus using scatterometry
Author(s): Steven Thanh Ha; Benjamin Eynon; Melany Wynia; Jeff Schmidt; Christian Sparka; Antonio Mani; Roie Volkovich; SeungHoon Yoon; David Tien; John Robinson; Saroja Ramamurthi
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Paper Abstract

Persistently shrinking design rules and increasing process complexity require tight control and monitoring of the exposure tool parameters [1, 2]. While control of exposure dose by means of resist single metric measurements is common and widely adopted. Focus assessment and monitoring are usually more difficult to achieve. A diffused method to determine process specific dose and focus conditions is based on plotting Bossung curves from single CD-SEM measurements and choosing the best focus setting to obtain the desired target CD with the widest useful window. With this approach there is no opportunity to build a data flow architecture that can enable continuous focus monitoring on nominal production wafers [3-5]. KLA-Tencor has developed a method to enable in-line monitoring of scanner focus on production wafers by measuring resist profile shapes on grating targets using scatterometry, and analyzing the information using AcuShapeTM and K-T AnalyzerTM software. This methodology is based on a fast and robust determination of best scanner focus by analyzing focus-exposure matrices (FEMs). This paper will demonstrate the KT CDFE and FEM Analysis methods and their application in production environment.

Paper Details

Date Published: 2 April 2014
PDF: 7 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90502Y (2 April 2014); doi: 10.1117/12.2047576
Show Author Affiliations
Steven Thanh Ha, SAMSUNG Austin Semiconductor LLC (United States)
Benjamin Eynon, SAMSUNG Austin Semiconductor LLC (United States)
Melany Wynia, SAMSUNG Austin Semiconductor LLC (United States)
Jeff Schmidt, SAMSUNG Austin Semiconductor LLC (United States)
Christian Sparka, KLA-Tencor Corp. (United States)
Antonio Mani, KLA-Tencor Corp. (United States)
Roie Volkovich, KLA-Tencor Corp. (United States)
SeungHoon Yoon, KLA-Tencor Corp. (United States)
David Tien, KLA-Tencor Corp. (United States)
John Robinson, KLA-Tencor Corp. (United States)
Saroja Ramamurthi, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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