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Proceedings Paper

High-precision self-tool CD matching with focus-target assist pattern by computational ways
Author(s): Sung-Man Kim; Hyun-Chul Kim; Jung-Woo Lee; Young-Seok Kim; Yong-Ho Kim; Sung-Keun Won; Sung-il (Andrew) Kim; Ki-Yeop (Chris) Park; Chang-Hoon Ryu; Qi-Tong Fan; Ki-Ho Baik
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Paper Abstract

As design rules of advance devices shrink down, not only process-window budget of lithography process is getting tighter, but also CD control to target is more important especially for multiple tool process environment in HVM (High Volume Manufacturing). The tool induced CD bias or CD difference between tools are derived by minute amount of residual imaging parameters even though with strict control in system. The tool to tool CD mismatch is able to be reduced to nanometer or sub-nanometer scale for critical features of concern by using released tools such as LithoTuner PMFCTM (Pattern Matcher Full Chip). During the matching process, tunable imaging parameters such as pupil shape and stage tilt can be used as matching knobs. In this paper, CD mismatch due to film stack change on same exposure tool was studied to check feasibility of PMFC application. Also, CD variation and its impact on CD mismatch by focus error as amount of intrinsic system was investigated as well. By considering the focus impact on CD proximity bias via simple mathematical ways, the CD matching process could be more accurately performed and verified.

Paper Details

Date Published: 2 April 2014
PDF: 7 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90502X (2 April 2014); doi: 10.1117/12.2047272
Show Author Affiliations
Sung-Man Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hyun-Chul Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jung-Woo Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Young-Seok Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Yong-Ho Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sung-Keun Won, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sung-il (Andrew) Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Ki-Yeop (Chris) Park, ASML Brion (Korea, Republic of)
Chang-Hoon Ryu, ASML Brion (Korea, Republic of)
Qi-Tong Fan, ASML Brion (Korea, Republic of)
Ki-Ho Baik, ASML Brion (Korea, Republic of)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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