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Proceedings Paper

Integrated ADI optical metrology solution for lithography process control of CD and OV
Author(s): Marlene Strobl; Wilhelm Tsai; Andy Lan; Tom Chen; Wilson Hsu; Henry Chen; Frida Liang; Alan Wang; Platt Hung; David Huang; Ethan Chiu; Paul Yu; Yi Song; Sylvia Yuan; Remco Dirks; Noelle Wright; Mariya Ponomarenko; Hugo Cramer; Baukje Wisse; Vincent Couraudon; Bijoy Rajasekharan; Reinder Plug; Stefan Kruijswijk; Henk Niesing
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Paper Abstract

Integrated metrology in the lithography cluster is a promising solution to tighten process control. It is shown that optical CD metrology using YieldStar, an angular resolved scatterometer, meets all requirements in terms of precision, process robustness, throughput and matching to CD-SEM, the current tool-of-reference. The same metrology tool supports also diffraction-based overlay metrology. Using an appropriate sampling plan and the full scanner correction capabilities, overlay control can be improved. The throughput of the integrated tool is sufficient to support high volume sampling plans for combined CD and overlay monitoring and control, with 100% lot coverage.

Paper Details

Date Published: 2 April 2014
PDF: 10 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90501J (2 April 2014); doi: 10.1117/12.2047205
Show Author Affiliations
Marlene Strobl, Inotera Taiwan (Taiwan)
Wilhelm Tsai, Inotera Taiwan (Taiwan)
Andy Lan, Inotera Taiwan (Taiwan)
Tom Chen, Inotera Taiwan (Taiwan)
Wilson Hsu, Inotera Taiwan (Taiwan)
Henry Chen, Inotera Taiwan (Taiwan)
Frida Liang, ASML Taiwan (Taiwan)
Alan Wang, ASML Taiwan (Taiwan)
Platt Hung, ASML Taiwan (Taiwan)
David Huang, ASML Taiwan (Taiwan)
Ethan Chiu, ASML Taiwan (Taiwan)
Paul Yu, ASML Taiwan (Taiwan)
Yi Song, ASML Netherlands B.V. (Netherlands)
Sylvia Yuan, ASML Netherlands B.V. (Netherlands)
Remco Dirks, ASML Netherlands B.V. (Netherlands)
Noelle Wright, ASML Netherlands B.V. (Netherlands)
Mariya Ponomarenko, ASML Netherlands B.V. (Netherlands)
Hugo Cramer, ASML Netherlands B.V. (Netherlands)
Baukje Wisse, ASML Netherlands B.V. (Netherlands)
Vincent Couraudon, ASML Netherlands B.V. (Netherlands)
Bijoy Rajasekharan, ASML Netherlands B.V. (Netherlands)
Reinder Plug, ASML Netherlands B.V. (Netherlands)
Stefan Kruijswijk, ASML Netherlands B.V. (Netherlands)
Henk Niesing, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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