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Proceedings Paper

Nanopatterning with tailored molecules
Author(s): Florian Wieberger; Tristan Kolb; Christian Neuber; Christopher K. Ober; Hans-Werner Schmidt
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Paper Abstract

Star block copolymer synthesis was performed in a controlled fashion by an in-situ core first ATRP route. The obtained resist materials on the basis of industrial used monomers with tailored star block copolymer architecture were systematically characterized and patterned. In dissolution investigations an excellent dissolution contrast between exposed and unexposed state was identified for this new resist material type. Additionally, the materials show an excellent sensitivity, which surpass the reference linear copolymer by a factor of eight. By a combinatorial resist optimization realized high resolution features are presented. Finally, preliminary results utilizing a further improved resist material design are shown.

Paper Details

Date Published: 27 March 2014
PDF: 11 pages
Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90510G (27 March 2014); doi: 10.1117/12.2047109
Show Author Affiliations
Florian Wieberger, Univ. Bayreuth (Germany)
Tristan Kolb, Univ. Bayreuth (Germany)
Christian Neuber, Univ. Bayreuth (Germany)
Christopher K. Ober, Cornell Univ. (United States)
Hans-Werner Schmidt, Univ. Bayreuth (Germany)


Published in SPIE Proceedings Vol. 9051:
Advances in Patterning Materials and Processes XXXI
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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