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Proceedings Paper

Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever
Author(s): Marcus Kaestner; Konrad Nieradka; Tzvetan Ivanov; Steve Lenk; Yana Krivoshapkina; Ahmad Ahmad; Tihomir Angelov; Elshad Guliyev; Alexander Reum; Matthias Budden; Tomas Hrasok; Manuel Hofer; Christian Neuber; Ivo W. Rangelow
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Paper Abstract

Within last two years, we have shown the positive-tone, development-less patterning of calixarene molecular glass resists using highly confined electric field, current-controlled scanning probe lithography scheme. Herein, we give a more detailed view insight describing the applied Scanning Probe Lithography (SPL) technology platform applying selfactuating, self-sensing cantilever. The experimental results are supported by first preliminary simulation results estimating the local electric field strength, the electron trajectories, and the current density distribution at the sample surface. In addition, the diameter of Fowler-Nordheim electron beam, emitted from SPL-tip, was calculated as function of the bias voltage for different current set-points and tip radii. In experimental part we show the reproducible writing of meander line patterns as well as the patterning of individual features using specially developed pattern generator software tool.

Paper Details

Date Published: 28 March 2014
PDF: 9 pages
Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90490C (28 March 2014); doi: 10.1117/12.2046973
Show Author Affiliations
Marcus Kaestner, Technische Univ. Ilmenau (Germany)
Konrad Nieradka, Technische Univ. Ilmenau (Germany)
Tzvetan Ivanov, Technische Univ. Ilmenau (Germany)
Steve Lenk, Technische Univ. Ilmenau (Germany)
Yana Krivoshapkina, Technische Univ. Ilmenau (Germany)
Ahmad Ahmad, Technische Univ. Ilmenau (Germany)
Tihomir Angelov, Technische Univ. Ilmenau (Germany)
Elshad Guliyev, Technische Univ. Ilmenau (Germany)
Alexander Reum, Technische Univ. Ilmenau (Germany)
Matthias Budden, Technische Univ. Ilmenau (Germany)
Tomas Hrasok, Technische Univ. Ilmenau (Germany)
Manuel Hofer, Technische Univ. Ilmenau (Germany)
Christian Neuber, Univ. Bayreuth (Germany)
Ivo W. Rangelow, Technische Univ. Ilmenau (Germany)

Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)

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