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Proceedings Paper

SRAF window improvement with under-coating layer
Author(s): Takahiro Hiromatsu; Toru Fukui; Kenta Tsukagoshi; Kazunori Ono; Masahiro Hashimoto
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Paper Abstract

A novel adhesion promoting material has been developed to prevent very small resist patterns from collapse. One target for the development of the material is to make an advanced negative-tone mask with 40 nm sub-resolution assist features (SRAF). The SRAF on photomasks has become shorter and shorter as well as narrowing. The 2-dimensional resist patterns easily collapse during the resist developing process. Resist under-coating material controlled the surface condition on a chrome absorber film, and it improved the resolution of the SRAF. As a result, SRAFs of 46nm width and 200nm length were achieved using the material. A negative-tone resist on the under-coating layer demonstrated 35 nm isolated line patterns on a mask without pattern collapse.

Paper Details

Date Published: 27 March 2014
PDF: 12 pages
Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 905120 (27 March 2014); doi: 10.1117/12.2046779
Show Author Affiliations
Takahiro Hiromatsu, HOYA Corp. (Japan)
Toru Fukui, HOYA Corp. (Japan)
Kenta Tsukagoshi, HOYA Corp. (Japan)
Kazunori Ono, HOYA Corp. (Japan)
Masahiro Hashimoto, HOYA Corp. (Japan)

Published in SPIE Proceedings Vol. 9051:
Advances in Patterning Materials and Processes XXXI
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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