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Proceedings Paper

Reduction of image placement error on photomask-making for multiple patterning
Author(s): Takahiro Hiromatsu; Toru Fukui; Kenta Tsukagoshi; Kazunori Ono; Masahiro Hashimoto
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Paper Abstract

To make photomasks with high overlay accuracy, “Charge Dissipation Layer (CDL)” materials have been developed. Commercialized CDL materials can reduce electro-static charging on the surface of resist during electron beam exposure. However, some side effects are introduced to the mask-making process. The resolution performance of chemically amplified resist (CAR) is degraded owing to acid diffusion from the CDL components to the resist surface. A newly developed CDL solved this problem by controlling the acid diffusion. A positive-tone CAR with the CDL showed no resolution degradation, and performance was maintained for over 30 days after coating CDL and resist. Furthermore, the CDL has been evaluated on a negative-tone CAR which is more sensitive to CDL.

Paper Details

Date Published: 27 March 2014
PDF: 10 pages
Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90510U (27 March 2014); doi: 10.1117/12.2046777
Show Author Affiliations
Takahiro Hiromatsu, HOYA Corp. (Japan)
Toru Fukui, HOYA Corp. (Japan)
Kenta Tsukagoshi, HOYA Corp. (Japan)
Kazunori Ono, HOYA Corp. (Japan)
Masahiro Hashimoto, HOYA Corp. (Japan)

Published in SPIE Proceedings Vol. 9051:
Advances in Patterning Materials and Processes XXXI
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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