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Proceedings Paper

Imaging control functions of optical scanners
Author(s): Hisashi Nishinaga; Toru Hirayama; Daiyu Fujii; Hajime Yamamoto; Hiroshi Irihama; Taro Ogata; Yukio Koizumi; Kenta Suzuki; Yohei Fujishima; Tomoyuki Matsuyama; Ryoichi Kawaguchi
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Paper Abstract

For future printing based on multiple patterning and directed self-assembly, critical dimension and overlay requirements become tighter for immersion lithography. Thermal impact of exposure to both the projection lens and reticle expansion becomes the dominant factor for high volume production. A new procedure to tune the thermal control function is needed to maintain the tool conditions to obtain high productivity and accuracy. Additionally, new functions of both hardware and software are used to improve the imaging performance even during exposure with high-dose conditions. In this paper, we describe the procedure to tune the thermal control parameters which indicate the response of projection lens aberration and reticle expansion separately. As new functionalities to control the thermal lens aberration, wavefront-based lens control software and reticle bending hardware are introduced. By applying these functions, thermal focus control can be improved drastically. Further, the capability of prediction of reticle expansion is discussed, including experimental data from overlay exposure and aerial image sensor results.

Paper Details

Date Published: 31 March 2014
PDF: 9 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 90520B (31 March 2014); doi: 10.1117/12.2046640
Show Author Affiliations
Hisashi Nishinaga, Nikon Corp. (Japan)
Toru Hirayama, Nikon Corp. (Japan)
Daiyu Fujii, Nikon Corp. (Japan)
Hajime Yamamoto, Nikon Corp. (Japan)
Hiroshi Irihama, Nikon Corp. (Japan)
Taro Ogata, Nikon Corp. (Japan)
Yukio Koizumi, Nikon Corp. (Japan)
Kenta Suzuki, Nikon Corp. (Japan)
Yohei Fujishima, Nikon Corp. (Japan)
Tomoyuki Matsuyama, Nikon Corp. (Japan)
Ryoichi Kawaguchi, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)

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