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Proceedings Paper

Model-based OPC using the MEEF matrix II
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Paper Abstract

In the traditional OPC (Optical Proximity Correction) procedure, edges in a layout are broken into fragments and each fragment is iteratively adjusted by multiplying its EPE (Edge Placement Error) with a carefully selected or calculated feedback. However, the ever-shrinking technology nodes in recent years bring stronger fragment to fragment interaction. The feedback tuning approach driven by a single fragment EPE is no longer sufficient to achieve good pattern fidelity with reasonable turn-around-time. Various novel techniques such as matrix OPC [1, 2] have been developed in the past to incorporate the influence of neighboring fragments into each fragment’s movement. Here we introduce a neighboraware feedback controller for full chip level OPC applications, following the concept and algorithms of the matrix OPC that were laid out in Cobb and Granik’s work [1]. We present experimental results and discuss the benefits and challenges of the proposed feedback controller.

Paper Details

Date Published: 31 March 2014
PDF: 9 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 90520N (31 March 2014); doi: 10.1117/12.2046635
Show Author Affiliations
Junjiang Lei, Mentor Graphics Corp. (United States)
Le Hong, Mentor Graphics Corp. (United States)
George Lippincott, Mentor Graphics Corp. (United States)
James Word, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)

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