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Proceedings Paper

Increased throughput, determined by a suite of benchmark patterns, in a Gaussian electron-beam lithography tool with a 100 MHz writing rate
Author(s): James H. Smith; Nigel Crosland; Samuel Doran; Robert C. Dowling; John G. Hartley; Philip C. Hoyle; David M. P. King; Lawrence Kutcher; Andrew McClelland; Martin Turnidge
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Paper Abstract

The Vistec VB3001 Gaussian electron-beam lithography system at the College of Nanoscale Science and Engineering (CNSE) in Albany routinely exposes 300 mm wafers to meet the requirements of nano-patterning for metrology and process tool qualification. CNSE and Vistec are partners in a continuous throughput improvement program. The second set of upgrades from this program has recently been implemented on CNSE’s VB300 and includes an increase in the maximum exposure clock frequency to 100 MHz and corresponding improvements to the sub-field deflection and beam blanker. To quantify the improvements, we have used an established suite of benchmark patterns2 to compare throughput “before and after”. These benchmark patterns show an average throughput improvement factor of 4 times over the timings at the start of the continuous improvement program.

Paper Details

Date Published: 28 March 2014
PDF: 9 pages
Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90490O (28 March 2014); doi: 10.1117/12.2046609
Show Author Affiliations
James H. Smith, Vistec Gaussian Beam Lithography, Inc. (United States)
Nigel Crosland, Vistec Gaussian Beam Lithography, Inc. (United States)
Samuel Doran, Consultant (United Kingdom)
Robert C. Dowling, Vistec Gaussian Beam Lithography, Inc. (United States)
John G. Hartley, Univ. at Albany (United States)
Philip C. Hoyle, Consultant (United Kingdom)
David M. P. King, Consultant (United Kingdom)
Lawrence Kutcher, Vistec Gaussian Beam Lithography, Inc. (United States)
Andrew McClelland, Cambeam Systems Design Services, Ltd. (United Kingdom)
Martin Turnidge, Vistec Gaussian Beam Lithography, Inc. (United States)

Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)

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