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Proceedings Paper

Adsorption characteristics of lithography filters in various solvents using application-specific ratings
Author(s): Toru Umeda; Shuichi Tsuzuki
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Paper Abstract

It is known that DUV resist filtration using Nylon 6,6 membrane significantly reduces microbridge defects. Previous work has described a method to determine an adsorption performance index using modified metal nanoparticles, which simulate interactions with microbridge defect precursors. In this paper, the effects of filter grade, filter material, and solvent type on adsorptive retention are explored. The adsorption rate in Nylon 6,6 40 nm filter was observed to be greater in both lower-LogPow and lower-viscosity solvents, possibly providing a direction for improved filtration performance based on the solvent properties. The complementary adsorption kinetics parameters give a more accurate suggestion for the filter performance in lithography applications combined with the conventional sieving filter ratings.

Paper Details

Date Published: 27 March 2014
PDF: 8 pages
Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90511G (27 March 2014); doi: 10.1117/12.2046588
Show Author Affiliations
Toru Umeda, Nihon Pall Ltd. (Japan)
Shuichi Tsuzuki, Nihon Pall Ltd. (Japan)


Published in SPIE Proceedings Vol. 9051:
Advances in Patterning Materials and Processes XXXI
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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