Share Email Print
cover

Proceedings Paper

The effect of individually-induced processes on image-based overlay and diffraction-based overlay
Author(s): SeungHwa Oh; Jeongjin Lee; Seungyoon Lee; Chan Hwang; Gilheyun Choi; Ho-Kyu Kang; EunSeung Jung
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In this paper, set of wafers with separated processes was prepared and overlay measurement result was compared in two methods; IBO and DBO. Based on the experimental result, theoretical approach of relationship between overlay mark deformation and overlay variation is presented. Moreover, overlay reading simulation was used in verification and prediction of overlay variation due to deformation of overlay mark caused by induced processes. Through this study, understanding of individual process effects on overlay measurement error is given. Additionally, guideline of selecting proper overlay measurement scheme for specific layer is presented.

Paper Details

Date Published: 2 April 2014
PDF: 8 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 905039 (2 April 2014); doi: 10.1117/12.2046583
Show Author Affiliations
SeungHwa Oh, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jeongjin Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seungyoon Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chan Hwang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Gilheyun Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Ho-Kyu Kang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
EunSeung Jung, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

© SPIE. Terms of Use
Back to Top