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Proceedings Paper

Mean offset optimization for multi-patterning overlay using Monte Carlo simulation method
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Paper Abstract

The overlay performance and alignment strategy optimization for a triple patterning (LELELE) were studied based on the Monte Carlo simulation method. The simulated results show that all of the combined or worst case overlay, alignment strategy, mean target of the upper level, and mean tolerance of the lower level are dependent on the means of the lower level. A dynamic mean control method is proposed to be integrated into the APC system to improve the overlay performance.

Paper Details

Date Published: 2 April 2014
PDF: 9 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90502O (2 April 2014); doi: 10.1117/12.2046580
Show Author Affiliations
Wenhui Wang, GLOBALFOUNDRIES Inc. (United States)
Liping Cui, GLOBALFOUNDRIES Inc. (United States)
Lei Sun, GLOBALFOUNDRIES Inc. (United States)
Ryoung-Han Kim, GLOBALFOUNDRIES Inc. (United States)

Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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