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Proceedings Paper

The factors affecting improvement sensitivity, CDU, and resolution in EUV resist
Author(s): Joonhee Han; Hyun Soon Lim; Jin Ho Kim; Sumi Choi; Jin Bong Shin; Chang Wan Bae; In Young Yoo; Bong Ha Shin; Eun Kyo Lee; Hyun Sang Joo; Dong Chul Seo; Jun Sung Chun
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Paper Abstract

The minimum target specificatons of EUV resist material are the resolution < 30nm half pitch C/H, CDU < 3.0nm, and sensitivity < 20mJ. The major pending issue of EUV resist is how to simultaneously achieve high sensitivity, high resolution and low CD Uniformity (CDU). Thus, we have studied that which factors such as acid diffusion, solvents, polymer platform and film density etc are affecting to improve CDU, sensitivity and resolution. Especially, CDU and sensitivity are the main issues among above these performances. With the results of these experiments, we could determine polymer blend PAG as polymer platform for EUV resist material. We have also researched polymer to improve the sensitivity and CDU with variation of molecular weight, poly dispersity and monomer feed ratio. Additionally, we have studied the effects of resist solvents and film density. And we have measured the outgas of our EUV resist. In this paper, we will discuss the results of these studies obtained by EUV tools of SEMATECH.

Paper Details

Date Published: 17 April 2014
PDF: 10 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90482R (17 April 2014); doi: 10.1117/12.2046573
Show Author Affiliations
Joonhee Han, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Hyun Soon Lim, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Jin Ho Kim, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Sumi Choi, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Jin Bong Shin, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Chang Wan Bae, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
In Young Yoo, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Bong Ha Shin, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Eun Kyo Lee, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Hyun Sang Joo, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Dong Chul Seo, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Jun Sung Chun, SEMATECH Inc. (United States)
SUNY College of Nanoscale Science and Engineering (United States)


Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood; Eric M. Panning, Editor(s)

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