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Proceedings Paper

Durability of Ru-based EUV masks and the improvement
Author(s): Suyoung Lee; Jungyoup Kim; Soo-Wan Koh; Ilyong Jang; Jaehyuck Choi; Hyungho Ko; Hwan-Seok Seo; Seong-Sue Kim; Byung Gook Kim; Chan-Uk Jeon
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Paper Abstract

In EUV Lithography, an absence of promising candidate of EUV pellicle demands new requirements of EUV mask cleaning which satisfy the cleaning durability and removal efficiency of the various contaminations from accumulated EUV exposure. It is known that the cleaning with UV radiation is effective method of variety of contaminants from surface, while it reduces durability of Ru capping layer. To meet the expectation of EUV mask lifetime, it is essential to understand the mechanism of Ru damage. In this paper, we investigate dominant source of Ru damage using cleaning method with UV radiation. Based on the mechanism, we investigate several candidates of capping to increase the tolerance from the cycled UV cleaning. In addition, we study durability difference depending on the deposition method of Ru capping. From these studies, it enables to suggest proper capping material, stack and cleaning process.

Paper Details

Date Published: 17 April 2014
PDF: 7 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90480J (17 April 2014); doi: 10.1117/12.2046556
Show Author Affiliations
Suyoung Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jungyoup Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Soo-Wan Koh, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Ilyong Jang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jaehyuck Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hyungho Ko, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hwan-Seok Seo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seong-Sue Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Byung Gook Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chan-Uk Jeon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood; Eric M. Panning, Editor(s)

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