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Proceedings Paper

Scanner performance predictor and optimizer in further low-k1 lithography
Author(s): Hajime Aoyama; Toshiharu Nakashima; Taro Ogata; Shintaro Kudo; Naonori Kita; Junji Ikeda; Ryota Matsui; Hajime Yamamoto; Ayako Sukegawa; Katsushi Makino; Masayuki Murayama; Kazuo Masaki; Tomoyuki Matsuyama
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Paper Abstract

Due to the importance of errors in lithography scanners, masks, and computational lithography in low-k1 lithography, application software is used to simultaneously reduce them. We have developed “Masters” application software, which is all-inclusive term of critical dimension uniformity (CDU), optical proximity effect (OPE), overlay (OVL), lens control (LNS), tool maintenance (MNT) and source optimization for wide process window (SO), for compensation of the issues on imaging and overlay. In this paper, we describe the more accurate and comprehensive solution of OPE-Master, LNS-Master and SO-Master with functions of analysis, prediction and optimization. Since OPE-Master employed a rigorous simulation, a root cause of error in OPE matching was found out. From the analysis, we had developed an additional knob and evaluated a proof-of- concept for the improvement. Influence of thermal issues on projection optics is evaluated with a heating prediction, and an optimization with scanner knobs on an optimized source taken into account mask 3D effect for obtaining usable process window. Furthermore, we discuss a possibility of correction for reticle expansion by heating comparing calculation and measurement.

Paper Details

Date Published: 31 March 2014
PDF: 12 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 90520A (31 March 2014); doi: 10.1117/12.2046547
Show Author Affiliations
Hajime Aoyama, Nikon Corp. (Japan)
Toshiharu Nakashima, Nikon Corp. (Japan)
Taro Ogata, Nikon Corp. (Japan)
Shintaro Kudo, Nikon Corp. (Japan)
Naonori Kita, Nikon Corp. (Japan)
Junji Ikeda, Nikon Corp. (Japan)
Ryota Matsui, Nikon Corp. (Japan)
Hajime Yamamoto, Nikon Corp. (Japan)
Ayako Sukegawa, Nikon Corp. (Japan)
Katsushi Makino, Nikon Corp. (Japan)
Masayuki Murayama, Nikon Corp. (Japan)
Kazuo Masaki, Nikon Corp. (Japan)
Tomoyuki Matsuyama, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)

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