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Proceedings Paper

Quantitative tabletop coherent diffraction imaging microscope for EUV lithography mask inspection
Author(s): Bosheng Zhang; Daniel E. Adams; Matthew D. Seaberg; Dennis F. Gardner; Elisabeth R. Shanblatt; Henry Kapteyn; Margaret Murnane
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Paper Abstract

Coherent diffraction imaging (CDI) has matured into a versatile phase-contrast microscopy technique capable of producing diffraction limited images without the need for high precision focusing elements. CDI has been most appropriately applied in the EUV/X-ray region of the spectrum where imaging optics are both difficult to produce and inefficient. By satisfying basic geometric constraints (such as Nyquist sampling of scattered intensities) diffraction imaging techniques essentially replace any imaging elements with sophisticated computer algorithms. We demonstrate the utility of our CDI-based, phase-contrast EUV microscope by quantitatively imaging objects in both transmission and reflection. Patterned feature depth is obtained in transmission using keyhole coherent diffraction imaging (KCDI) and feature height is quantitatively extracted in the first general, table-top reflection mode CDI microscope.

Paper Details

Date Published: 2 April 2014
PDF: 9 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90501D (2 April 2014); doi: 10.1117/12.2046526
Show Author Affiliations
Bosheng Zhang, Univ. of Colorado at Boulder (United States)
JILA (United States)
Daniel E. Adams, Univ. of Colorado at Boulder (United States)
JILA (United States)
Matthew D. Seaberg, Univ. of Colorado at Boulder (United States)
JILA (United States)
Dennis F. Gardner, Univ. of Colorado at Boulder (United States)
JILA (United States)
Elisabeth R. Shanblatt, Univ. of Colorado at Boulder (United States)
JILA (United States)
Henry Kapteyn, Univ. of Colorado at Boulder (United States)
JILA (United States)
Margaret Murnane, Univ. of Colorado at Boulder (United States)
JILA (United States)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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