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Proceedings Paper

Real-time inspection system utilizing scatterometry pupil data
Author(s): Jae Yeon Baek; Philippe Leray; Anne-Laure Charley; Costas J. Spanos
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Paper Abstract

Scatterometry-based CD, also known as Optical CD (OCD) significantly matches CD-SEM in accuracy and precision, in addition to offering superior full-profile reconstruction. OCD, however, is computationally intensive. In this paper, we construct an extremely fast screening tool that determines whether a sample should or should not proceed to subsequent manufacturing steps. To this end we examine the diffraction signals of the grating in order to determine whether a sample is in or out of its specification limits. This allows us to allocate traditional metrology resources only on samples that show unusual behavior. Support vector machines (SVM) are trained to classify each incoming sample as in-spec or outof- spec. The constructed classifier is applied to gratings exposed with a focus-exposure matrix for a rectangular silicon- BARC-photoresist stack, which include erroneous samples with under-over exposure, necking, and bridging problems. The misclassification rates as well as false and missed alarm rates are analyzed. Results show that our prototype screening system has misclassification errors on the order of 5-10 %, while the computation time is on the order of one vector dot product.

Paper Details

Date Published: 2 April 2014
PDF: 11 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 905019 (2 April 2014); doi: 10.1117/12.2046518
Show Author Affiliations
Jae Yeon Baek, Univ. of California, Berkeley (United States)
Philippe Leray, IMEC (Belgium)
Anne-Laure Charley, IMEC (Belgium)
Costas J. Spanos, Univ. of California, Berkeley (United States)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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