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Proceedings Paper

Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk
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Paper Abstract

This paper extends the state of the art by demonstrating performance improvements in the Domain Decomposition Method (DDM) from a physical perturbation of the input mask geometry. Results from four testcases demonstrate that small, direct modifications in the input mask stack slope and edge location can result in model calibration and verification accuracy benefit of up to 30%. All final mask optimization results from this approach are shown to be valid within measurement accuracy of the dimensions expected from manufacture. We highlight the benefits of a more accurate description of the 3D EMF near field with crosstalk in model calibration and impact as a function of mask dimensions. The result is a useful technique to align DDM mask model accuracy with physical mask dimensions and scattering via model calibration.

Paper Details

Date Published: 31 March 2014
PDF: 7 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 905216 (31 March 2014); doi: 10.1117/12.2046489
Show Author Affiliations
David Fryer, Mentor Graphics Corp. (United States)
Michael Lam, Mentor Graphics Corp. (United States)
Kostas Adam, Mentor Graphics Corp. (United States)
Chris Clifford, Mentor Graphics Corp. (United States)
Mike Oliver, Mentor Graphics Corp. (United States)
Christian Zuniga, Mentor Graphics Corp. (United States)
John Sturtevant, Mentor Graphics Corp. (United States)
ChangAn Wang, GLOBALFOUNDRIES Inc. (United States)
Scott Mansfield, IBM Corp. (United States)


Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)

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