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Proceedings Paper

High resolution patterning for flexible electronics via roll-to-roll nanoimprint lithography
Author(s): Sami Sabik; Joris de Riet; Iryna Yakimets; Edsger Smits
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Paper Abstract

Flexible electronics is a growing field and is currently maturing in applications such as displays, smart packaging, organic light-emitting diodes and organic photovoltaic cells. In order to process on flexible substrates at high throughput and large areas, novel patterning techniques will be essential. Conventional optical lithography is limited in throughput as well as resolution, and requires several alignment steps to generate multi-layered patterns, required for applications such as thin-film transistors. It therefore remains a complex and expensive process. Nanoimprint lithography is an emerging alternative to optical lithography, demonstrating patterning capabilities over a wide range of resolutions, from several microns down to a few nanometres. For display applications, nanoimprint lithography can be used to pattern various layers. Micron sized thin-film transistors for backplane can be fabricated where a self-aligned geometry is used to decrease the number of alignment steps, and increase the overlay accuracy. In addition, nano-structures can be used for optical applications such as anti-reflective surfaces and nano patterned transparent electrodes. Imprint lithography is a fully roll-to-roll compatible process and enables large area and high throughput fabrication for flexible electronics. In this paper we discuss the possibilities and the challenges of large area patterning by roll-to-roll nanoimprint lithography, reviewing micron and nano sized structures realized on our roll-to-roll equipment. Nano patterned transparent electrodes, moth-eye antireflective coatings, and multilevel structures will be covered.

Paper Details

Date Published: 28 March 2014
PDF: 9 pages
Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90490F (28 March 2014); doi: 10.1117/12.2046479
Show Author Affiliations
Sami Sabik, TNO (Netherlands)
Joris de Riet, TNO (Netherlands)
Iryna Yakimets, TNO (Netherlands)
Edsger Smits, TNO (Netherlands)


Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)

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