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Proceedings Paper

Isolation mounts scatterometry with RCWA and PML
Author(s): Hirokimi Shirasaki
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Paper Abstract

In this paper, we examine the sensitivity of scatterometry for the isolation mounts on the substrate by applying PML in RCWA. We analyze the reflectance from the silicon and resist single mount and the silicon double mounts on the silicon substrate. First, we investigate the mode convergences and the beam width dependences of reflectance. Second, we show the propagation properties of the electromagnetic fields propagating for the isolation mounts on the silicon substrate. Finally, we examine the wavelength properties of reflectance calculated by changing the beam width, the mount width and the mount height for single mount and the silicon mount positions for the double silicon mounts. Then, we understand that the scatterometry observation is possible in several decade microns beam width.

Paper Details

Date Published: 2 April 2014
PDF: 7 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90502K (2 April 2014); doi: 10.1117/12.2046394
Show Author Affiliations
Hirokimi Shirasaki, Tamagawa Univ. (Japan)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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