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Proceedings Paper

In-situ FTIR spectroscopy to study surface chemistry of SIS lithography
Author(s): Mahua Biswas; Joseph A. Libera; Seth B. Darling; Jeffrey W. Elam
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Date Published:
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Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90510F; doi: 10.1117/12.2046372
Show Author Affiliations
Mahua Biswas, Argonne National Lab. (United States)
Joseph A. Libera, Argonne National Lab. (United States)
Seth B. Darling, Argonne National Lab. (United States)
The Univ. of Chicago (United States)
Jeffrey W. Elam, Argonne National Lab. (United States)


Published in SPIE Proceedings Vol. 9051:
Advances in Patterning Materials and Processes XXXI
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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