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Modeling the effect of adjustable block copolymer morphology in directed self-assembly: Application to line-width roughness and to shrink of elliptical holes
Author(s): Jeffrey D. Weinhold; Valeriy V. Ginzburg; Phillip D. Hustad; Peter Trefonas
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Proc. SPIE 9049, Alternative Lithographic Technologies VI, ; doi: 10.1117/12.2046335
Show Author Affiliations
Jeffrey D. Weinhold, The Dow Chemical Co. (United States)
Valeriy V. Ginzburg, The Dow Chemical Co. (United States)
Phillip D. Hustad, Dow Electronic Materials (United States)
Peter Trefonas, Dow Electronic Materials (United States)


Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)

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